English, Article edition: DEPOSITION OF AlN AND OXIDIZED AlN THIN-FILMS BY REACTIVE SPUTTERING: CORRELATION BETWEEN FILM GROWTH AND DEPOSITION PARAMETERS MANUEL GARCÃA-MÃNDEZ; SANTOS MORALES-RODRÃGUEZ; LUCIANO ELIÃZER RAMÃREZ; ...

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Bookmark: http://trove.nla.gov.au/version/85110
Physical Description
  • article
Language
  • English

Edition details

Title
  • DEPOSITION OF AlN AND OXIDIZED AlN THIN-FILMS BY REACTIVE SPUTTERING: CORRELATION BETWEEN FILM GROWTH AND DEPOSITION PARAMETERS
Author
  • MANUEL GARCÃA-MÃNDEZ
  • SANTOS MORALES-RODRÃGUEZ
  • LUCIANO ELIÃZER RAMÃREZ
  • EDUARDO G. PÃREZ-TIJERINA
Physical Description
  • article
Notes
  • A set of AlN films were deposited by reactive direct current (DC) magnetron sputtering. Films were analyzed with X-ray diffraction and Auger Electron Spectroscopy (AES). There is a correlation between deposition parameters and crystal growth. Depending on the deposition parameters, films can present a hexagonal würzite (P6mm) or cubic zinc-blend (Fm3m) microstructure. Oxygen appears to induce on films a degree of amorphous growth and a distortion of the lattice parameters. For the film with cubic microstructure, AES transitions detected near the surface level at 56 eV and 66 eV were attributed to aluminum-oxide (AlxOy), AlN, and metallic Al.
  • AIN, thin-films, X-ray diffraction, auger electron spectroscopy, deposition parameters
  • RePEc:wsi:srlxxx:v:15:y:2008:i:04:p:453-458
Language
  • English
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