English, Article edition: STUDIES ON THE HETEROJUNCTION STRUCTURE OF n-Si/p-NANOCRYSTALLINE DIAMOND FILM LINJUN WANG; JIANMIN LIU; LING REN; ...

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Physical Description
  • article
Language
  • English

Edition details

Title
  • STUDIES ON THE HETEROJUNCTION STRUCTURE OF n-Si/​p-NANOCRYSTALLINE DIAMOND FILM
Author
  • LINJUN WANG
  • JIANMIN LIU
  • LING REN
  • QINGFENG SU
  • RUN XU
  • WEIMIN SHI
  • YIBEN XIA
Physical Description
  • article
Notes
  • An undoped p-type nanocrystalline diamond (NCD) film was grown by an electron assisted hot filament chemical vapor deposition (EA-HFCVD) technology on an n-type single-crystalline Si substrate to fabricate p-NCD/​n-Si heterojunction. The structure and morphology of the NCD film, which was analyzed by Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM), showed that the film consisted of 40â60 nm polycrystalline nano-grains. The results showed that with EA-HFCVD method, not only an undoped NCD film with high conductivity but also a pân heterojunction diode between the NCD film and n-Si substrate was fabricated successfully. The p-NCD/​n-Si heterostructure was also used for ultraviolet (UV) photodetector application. Operating at a bias voltage of 10 V, this photodetector showed a significant discrimination between UV and visible light, and the UV/​visible-blind ratio was about three orders of magnitude.
  • Nanocrystalline diamond film, electrical properties, chemical vapor deposition
  • RePEc:wsi:srlxxx:v:14:y:2007:i:04:p:761-764
Language
  • English
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