English, Article edition: MACRODROPLET REDUCTION AND GROWTH MECHANISMS IN CATHODIC ARC PHYSICAL VAPOR DEPOSITION OF TiN FILMS MUBARAK ALI; ESAH HAMZAH; TAHIR ABBAS; ...

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Bookmark: http://trove.nla.gov.au/version/84713
Physical Description
  • article
Language
  • English

Edition details

Title
  • MACRODROPLET REDUCTION AND GROWTH MECHANISMS IN CATHODIC ARC PHYSICAL VAPOR DEPOSITION OF TiN FILMS
Author
  • MUBARAK ALI
  • ESAH HAMZAH
  • TAHIR ABBAS
  • MOHD RADZI HJ. MOHD TOFF
  • ISHTIAQ A. QAZI
Physical Description
  • article
Notes
  • Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated in TiN coatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets.
  • Cathodic arc, PVD, TiN, macrodroplets, morphology, surface roughness
  • RePEc:wsi:srlxxx:v:15:y:2008:i:05:p:653-659
Language
  • English
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