INFLUENCE OF ELECTRON SCATTERING FROM MORPHOLOGICAL GRANULARITY AND SURFACE ROUGHNESS ON THIN FILM ELECTRICAL RESISTIVITY
A. R. VAZ
R. S. WIEDERKEHR
F. S. TEIXEIRA
M. C. SALVADORI
I. G. BROWN
We report electrical resistivity measurements of platinum and gold thin films over a range of film thickness d (1.3 â¤ d â¤ 11.7nm), together with associated measurements of the film morphological and crystallographic grain size. The resistivity results are compared to predictions of the FuchsâSondheimer and the MayadasâShatzkes models, based on the electron mean free path and crystallographic grain size, and the agreement is not satisfactory. We describe an alternative model based on elastic electron scattering with morphological granularity (grain structure as measured on the film surface) and film surface roughness, and good agreement is obtained with the experimental results. This suggests that electron scattering by morphological granularity and surface roughness plays an important role in determining the electrical resistivity of thin metal films.
In order to set up a list of libraries that you have access to,
you must first login
or sign up.
Then set up a personal list of libraries from your profile page by
clicking on your user name at the top right of any screen.