English, Article edition: SELF-LIMITING GROWTH OF TITANIUM SILICATE AND EFFECTS OF THERMAL ANNEALING ON THE ELECTRICAL PROPERTIES OF TITANIUM SILICATE/SiO2 SEUNGJAE LEE; KIJUNG YONG

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Bookmark: http://trove.nla.gov.au/version/84604
Physical Description
  • article
Language
  • English

Edition details

Title
  • SELF-LIMITING GROWTH OF TITANIUM SILICATE AND EFFECTS OF THERMAL ANNEALING ON THE ELECTRICAL PROPERTIES OF TITANIUM SILICATE/​SiO2
Author
  • SEUNGJAE LEE
  • KIJUNG YONG
Physical Description
  • article
Notes
  • Titanium silicate thin films were deposited using self-limiting atomic layer growth technique. Grown films showed smooth film surface morphology. As deposited, 8 nm-thick film surface showed an RMS value of 0.43 nm and annealed film showed a smoother surface having RMS of 0.2 nm. Electrical properties of titanium silicate/​SiO2 bilayer were investigated using capacitanceâvoltage (CâV) and leakage current-voltage (IâV) measurements. The grown films showed high dielectric properties with low impurity contents and low leakage currents. Upon annealing at 800°C, capacitance slightly decreased, which is likely due to the interfacial reactions. Generally thermal annealing decreased hysteresis in CâV results.
  • Titanium silicate, Gate oxide, ALD
  • RePEc:wsi:srlxxx:v:14:y:2007:i:05:p:921-925
Language
  • English
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