English, Article edition: THE CHARACTERISTIC OF AS-GROWN AND POST-ANNEALED NITROGEN DOPED AMORPHOUS CARBON THIN FILMS DEPOSITED BY SURFACE WAVE MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION METHOD M. RUSOP; S. ABDULLAH; S. ADHIKARI; ...

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Bookmark: http://trove.nla.gov.au/version/84449
Physical Description
  • article
Language
  • English

Edition details

Title
  • THE CHARACTERISTIC OF AS-GROWN AND POST-ANNEALED NITROGEN DOPED AMORPHOUS CARBON THIN FILMS DEPOSITED BY SURFACE WAVE MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION METHOD
Author
  • M. RUSOP
  • S. ABDULLAH
  • S. ADHIKARI
  • A. M. M. OMER
  • T. SOGA
  • T. JIMBO
  • M. UMENO
Physical Description
  • article
Notes
  • Nitrogen doped amorphous carbon (a-C:N) thin films were deposited on silicon and quartz substrates by microwave surface-wave plasma chemical vapor deposition (SWMP-CVD) technique at low temperatures (<100°C). We used argon (Ar), camphor dissolved in alcohol, and nitrogen (N) as carrier, source, and dopant gases, respectively. Optical band gap (Eg) decreased from 4.1 to 2.4 eV when the N gas concentration increased from 0% to 4.5%. The films were annealed at different temperatures ranging from 150°C to 450°C in Ar gas environment to investigate the optical and electrical properties of the films before and after annealing. Both Eg and electrical resistivity (Ï) decreased dramatically up to 0.95 eV and 57Ã103 Ω cm at 450°C annealing. The structural modifications of the films leading them to become more graphitized as a function of the annealing temperature were confirmed by the characterization of Raman spectra.
  • Amorphous carbon, nitrogen, surface wave, microwave, PECVD, annealing, optical band gap
  • RePEc:wsi:srlxxx:v:13:y:2006:i:05:p:593-598
Language
  • English
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