English, Article edition: GROWTH OF ZIRCONIUM SILICATE THIN FILM BY PULSED-MOCVD USING ZTB AND TDEAS JAEHYUN KIM; KIJUNG YONG

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Bookmark: http://trove.nla.gov.au/version/84279
Physical Description
  • article
Language
  • English

Edition details

Title
  • GROWTH OF ZIRCONIUM SILICATE THIN FILM BY PULSED-MOCVD USING ZTB AND TDEAS
Author
  • JAEHYUN KIM
  • KIJUNG YONG
Physical Description
  • article
Notes
  • Zirconium silicate (ZrxSi1-xO2) thin films were deposited by pulsed metal-organic chemical vapor deposition (MOCVD) using zirconium tert-butoxide (ZTB) and tetrakis-diethylamido silane (TDEAS). The growth temperature of 200â300°C was used to deposit films with uniform thickness. The grown films showed the Zr-rich composition, which is thought to induce the Zr-silicide formation at the interface of the silicate and Si substrate. The film composition and chemical binding states were investigated by XPS depth profiling measurements.
  • Zirconium silicate, MOCVD, metal oxide
  • RePEc:wsi:srlxxx:v:13:y:2006:i:05:p:567-571
Language
  • English
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