English, Article edition: EFFECTS OF METHANE GAS FLOW RATE ON THE OPTOELECTRICAL PROPERTIES OF NITROGENATED CARBON THIN FILMS GROWN BY SURFACE WAVE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION M. RUSOP; S. ABDULLAH; A. M. M. OMER; ...

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Bookmark: http://trove.nla.gov.au/version/83942
Physical Description
  • article
Language
  • English

Edition details

Title
  • EFFECTS OF METHANE GAS FLOW RATE ON THE OPTOELECTRICAL PROPERTIES OF NITROGENATED CARBON THIN FILMS GROWN BY SURFACE WAVE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION
Author
  • M. RUSOP
  • S. ABDULLAH
  • A. M. M. OMER
  • S. ADHIKARI
  • T. SOGA
  • T. JIMBO
  • M. UMENO
Physical Description
  • article
Notes
  • We have studied the influence of the methane gas (CH4) flow rate on the composition and structural and electrical properties of nitrogenated amorphous carbon (a-C:N) films grown by surface wave microwave plasma chemical vapor deposition (SWMP-CVD) using Auger electron spectroscopy, X-ray photoelectron spectroscopy, UV-visible spectroscopy, four-point probe and two-probe method resistance measurement. The photoelectrical properties of a-C:N films were also studied. We have succeeded to grow a-C:N films using a novel method of SWMP-CVD at room temperature and found that the deposition rate, bonding and optical and electrical properties of a-C:N films are strongly dependent on the CH4 gas sources, and the a-C:N films grown at higher CH4 gas flow rate have relatively high electrical conductivity for both cases of in dark and under illumination condition.
  • Surface wave, microwave, methane, gas flow rate, amorphous carbon nitride, a-C:N
  • RePEc:wsi:srlxxx:v:13:y:2006:i:05:p:585-592
Language
  • English
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