STRUCTURAL AND OPTICAL PROPERTIES OF ZnO THIN FILMS GROWN ON FLEXIBLE POLYIMIDE SUBSTRATES
DONG ICK SON
JUNG WOOK LEE
DEA UK LEE
TAE WHAN KIM
WON KOOK CHOI
Nominally undoped ZnO thin films were grown on polyimide (PI) substrates at various temperatures by using radio-frequency magnetron sputtering. Atomic force microscopy images showed that the root mean squares of the average surface roughnesses for the ZnO thin films grown on the PI substrates at 27Â°C, 100Â°C, 200Â°C, and 300Â°C were 4.08, 4.50, 4.18, and 3.89 nm, respectively. X-ray diffraction patterns showed that the crystallinity of the ZnO films had a preferential (0001) direction and that the full width at half-maxima for the (0002) ZnO diffraction peak for the ZnO thin films grown on the PI substrates at 27Â°C, 100Â°C, 200Â°C, and 300Â°C were 0.22, 0.22, 0.22, and 0.23, respectively. The average optical transmittances in the visible ranges between 550 and 750 nm for the ZnO/PI heterostructures grown at 27Â°C, 100Â°C, 200Â°C, and 300Â°C were 87%, 83%, 87%, and 78%, respectively.
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