English, Article edition: EFFECTS OF OPERATING CONDITIONS ON THE DEPOSITION OF GaAs IN A VERTICAL CVD REACTOR JAE-SANG BAEK; JIN-HYO BOO; YOUN-JEA KIM

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Bookmark: http://trove.nla.gov.au/version/83726
Physical Description
  • article
Language
  • English

Edition details

Title
  • EFFECTS OF OPERATING CONDITIONS ON THE DEPOSITION OF GaAs IN A VERTICAL CVD REACTOR
Author
  • JAE-SANG BAEK
  • JIN-HYO BOO
  • YOUN-JEA KIM
Physical Description
  • article
Notes
  • A numerical study is needed to gain insight into the growth mechanism and improve the reactor design or optimize the deposition condition in chemical vapor deposition (CVD). In this study, we have performed a numerical analysis of the deposition of gallium arsenide (GaAs) from trimethyl gallium (TMG) and arsine in a vertical CVD reactor. The effects of operating parameters, such as the rotation velocity of susceptor, inlet velocity, and inlet TMG fraction, are investigated and presented. The three-dimensional model which is used in this investigation includes complete coupling between the thermal-fluid transport and species transport with chemical reaction.
  • CVD, gallium arsenide, reactor design, Arrhenius model, deposition rate
  • RePEc:wsi:srlxxx:v:15:y:2008:i:01:p:111-116
Language
  • English
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