English, Article edition: PREPARATION AND CHARACTERIZATION OF In2O3 THIN FILMS FOR OPTOELECTRONIC APPLICATIONS RAID A. ISMAIL; OMAR A. ABDULRAZAQ; KHALID Z. YAHYA

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Bookmark: http://trove.nla.gov.au/version/83579
Physical Description
  • article
Language
  • English

Edition details

Title
  • PREPARATION AND CHARACTERIZATION OF In2O3 THIN FILMS FOR OPTOELECTRONIC APPLICATIONS
Author
  • RAID A. ISMAIL
  • OMAR A. ABDULRAZAQ
  • KHALID Z. YAHYA
Physical Description
  • article
Notes
  • Conductive transparent In2O3 thin films with (222)-preferred orientation were prepared by rapid thermal oxidation (RTO) in static air of indium thin films at condition 200°C/​30 s. Detailed structural, electrical, and optical characteristics of the film are presented. The data are interpreted to give a direct bandgap of 3.6 eV and indirect bandgap of 2.5 eV. The grown In2O3 films exhibited high figure of merit and sheet resistance as low as 20 Ω/​sq. in the absence of any post-deposition annealing conditions. The mobility of these films was estimated to be 31 cm2 · V-1 · s-1. These results are compared with those of In2O3 films prepared by other methods.
  • Rapid thermal oxidation, In2O3 thin films, figure of merit
  • RePEc:wsi:srlxxx:v:12:y:2005:i:04:p:515-518
Language
  • English
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