English, Article edition: DIAMOND DEPOSITION ON WC/Co ALLOY WITH A MOLYBDENUM INTERMEDIATE LAYER SHA LIU; ZHI-MING YU; DAN-QING YI

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Bookmark: http://trove.nla.gov.au/version/83554
Physical Description
  • article
Language
  • English

Edition details

Title
  • DIAMOND DEPOSITION ON WC/​Co ALLOY WITH A MOLYBDENUM INTERMEDIATE LAYER
Author
  • SHA LIU
  • ZHI-MING YU
  • DAN-QING YI
Physical Description
  • article
Notes
  • It is known that in the condition of chemical vapor deposition (CVD) diamond process, molybdenum is capable of forming carbide known as the "glue" which promotes growth of the CVD diamond, and aids its adhesion by (partial) relief of stresses at the interface. Furthermore, the WC grains are reaction bonded to the Mo2C phase. Therefore, molybdenum is a good candidate material for the intermediate layer between WCâCo substrates and diamond coatings. A molybdenum intermediate layer of 1â3 μm thickness was magnetron sputter-deposited on WC/​Co alloy prior to the deposition of diamond coatings. Diamond films were deposited by hot filament chemical vapor deposition (HFCVD). The chemical quality, morphology, and crystal structure of the molybdenum intermediate layer and the diamond coatings were characterized by means of SEM, EDX, XRD and Raman spectroscopy. It was found that the continuous Mo intermediate layer emerged in spherical shapes and had grain sizes of 0.5â1.5 μm after 30 min sputter deposition. The diamond grain growth rate was slightly slower as compared with that of uncoated Mo layer on the WCâCo substrate. The morphologies of the diamond films on the WCâCo substrate varied with the amount of Mo and Co on the substrate. The Mo intermediate layer was effective to act as a buffer layer for both Co diffusion and diamond growth.
  • Deposition, thin films, molybdenum intermediate layer, cemented carbides
  • RePEc:wsi:srlxxx:v:12:y:2005:i:04:p:499-504
Language
  • English
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